Description:
The objective of this course is to provide participants the basic principles and practical aspects of the most advanced state of nanofabrication methods. The emphasis of this course is on the fundamental principles of thin film nucleation and growth, atomic layer deposition, focused ion beam etching and CVD, and nanofabrication by electroplating with templates. Many of these processing methods are at moderate to low temperatures which offers potential compatibility with IC circuit fabrication to facilitate nanodevice integration. Selected examples will be provided to highlight exciting possibilities for three dimensional fabrication at the nanoscale which open up new capabilities for novel structure fabrication and integration. These include a porous platinum film immunobiosensor, a custom fabricated scanning electrochemical probe and novel nanostructures.
The syllabus will include the following topics:
Physical Vapor Deposition (i) Vapor Pressure and Deposition Rate, (ii) Ultrathin Film Growth, (iii) Impedance Based Immunobiosensor
Atomic Layer Deposition, (i) Introduction, (ii) Semiconductors, (iii) Dielectric Films, (iv) Other Metal Oxide and Nitride Films, (v) Metals, (vi) MEMS Applications of ALD, (vii) Integration with Porous Membranes and Templates
Focused Ion Beam Processing, (i) Introduction, (ii) Applications of FIB, (iii) FIB CVD
Electroplating of Nanostructures, (i) Electrochemical Cells for Electroplating, (ii) Templates, (iii) Ferromagnetic Nanowire Materials, (iv) Noble Metal Nanowires, (v) Metal Oxide Nanowires
Final Program